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Jens Krause

 Integrated Systems Laboratory, ETH Zürich
CH-8053 Zürich, Switzerland
E-mail: jens.krause@iis.ee.ethz.ch

MESHING
RESEARCH
CORNER

Hitschfeld, N.; Villablanca, L.; Krause, J.; Rivara, M. C.

    "Improving the quality of meshes for the simulation of semiconductor devices using Lepp-based algorithms", International Journal for Numerical Methods in Engineering, John Wiley & Sons, Ltd., Vol 58, Num 2, pp.333-347, July 2003
    keywords:
    • control volume method
      		•
    • Delaunay meshes
    • Lepp-based algorithms
      		•
    • non-obtuse boundary meshes
    • semiconductor device simulation
      		•
    Abstract

Krause, J., N. Strecker and W. Fichtner
    "Boundary-sensitive mesh generation using an offsetting technique", International Journal for Numerical Methods in Engineering, John Wiley, Vol 49, Num 1, pp.51-59, September 10-20 2000
    keywords:
    • advancing front
      		•
    • boundary layers
    • offsetting
      		•
    • quadrilateral
    • semiconductor
      		•
    • hybrid
    • advancing layers
      		•
    Abstract

Krause, J., W. Fichtner
    "Boundary Sensitive Mesh Generation using an Offsetting Technique", 2nd Symposium on Trends in Unstructured Mesh Generation, University of Colorado, Boulder, August 1999
    keywords:
    • boundary layer
      		•
    • offsetting
    • advancing front
      		•
    • quadrilateral
    Abstract

Krause, Jens; Villablanca, Luis; Strecker, Norbert; Fichtner, Wolfgang
    "Robust Anisotropic 3D Grid Generation Using A Normal Offsetting Approach", Numerical Grid Generation in Computational Field Simulations, The International Society of Grid Generation, pp.305-314, September 2000
    keywords:
    • advancing front
      		•
    • advancing-front
    • Delaunay
      		•
    • iso-surface
    • parallel
      		•
    • semiconductor
    Abstract

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