SEMITIP V6, program MultInt3

Introduction

This program computes the electrostatic potential and the resulting tunnel current between a metallic tip and a nonuniform (inhomogeneous) semiconducting sample, for a fully 3-dimensional geometry. The tunnel current is computed by integrating the Schrödinger equation along the central axis of the problem (i.e. as appropriate for a planar geometry, but an approximation for a nonplanar geometry).

Version information

Version 6.4; see top of MultInt3-6.4.f source code in example(s) below for prior version information.

Usage

Source code files for the program are available in the example(s) provided below. In order to specify the inhomogeneities in the semiconductor, it is necessary to modify the source code as follows: Additional details of these source code modifications can be found in the SEMITIP V6 Technical Manual. With the appropriate modifications, the source code of the main program, together with the subroutines listed below, must by re-compiled and linked in order to produce the executable code. All input for the program (other than that modifications to the source code detailed above) comes from the file FORT.9, which is also included in the example(s) provided below.

Compared to a uniform semiconductor and surface, there are several additional considerations that must be taken into account for handling a nonuniform situation. For one thing, the grid size must be more carefully specified, and additional testing is needed to ensure that it is of an appropriate size. If the grid is too small, then the solution might not converge, and if it is too large then significant errors can be produced. The grid for this nonuniform case is determined by the doping of region 1 of the semiconductor (along with the tip radius and tip-sample separation); if this region has relatively high doping compared to other regions then a larger grid size than the default one (using the multiplicative scaling parameter on line 53 of FORT.9) might be necessary, and conversely if region 1 has relatively low doping then a smaller grid size might be necessary. Concerning the specified contact potential, this is also applicable to region 1; for other regions it will vary, depending on the electrostatic potential in that region, just as it should in accordance with the varying work function from region to region.

In version 6.3 and beyond, two parameters were added the input file FORT.9 (lines 7 and 8) that specify the (x,y) position of the probe tip. (If a horizontal mirror plane is assumed in the solution, line 48 of FORT.9, then the y position of the tip is set to zero). For scanning a probe tip over the semiconductor surface, it is these x and/or y positions that should be varied, along with a possible change in the tip-sample separation. All other parameters in the input file should remain unchanged.

Output

Output from the program is contained in the following files (output depends on the value of the output parameter IWRIT as specified in the input file FORT.9):

All of the parameters in the program can be varied using the input file FORT.9, with the exception of the array sizes, the specification of a surface state density other than a uniform or Gaussian shaped one, and the specification of spatial arrangement of bulk or surface charge density. See SEMITIP V6 Technical Manual for additional information on these user-defined functions. Modification of those functions can be accomplished by changing the source code of the program. The source code is available, in the following files (version numbers follow the dash in the names):

All routines are written in Fortran. The source code can be downloaded directly from the above locations, and it can be compiled and linked on any platform. Sample input and output from the program is shown in the examples below.

Illustrative Examples of Running the Code

  1. GaAs(110) pn junction